High-speed, high-durability valve for ALD processes: "TDF Series"
High-speed opening and closing with high response stability! Capable of accommodating special face-to-face dimensions, valve shapes, and corrosion-resistant material bodies.
The "TDF Series" is a high-purity gas diaphragm valve that combines high-speed opening and closing, high durability, corrosion resistance, heat resistance, and Cv stability, all of which are necessary for the ALD (Atomic Layer Deposition) process. It adopts a structure that reduces thermal conduction to the actuator, making it suitable for high-temperature fluids up to 220°C. The Cv values are adjusted for all units at the time of factory shipment, resulting in minimal variation in Cv values during use and stable gas flow. 【Features】 ■ High-speed opening and closing with high response stability #High response ■ Compatible with high-temperature fluids ■ Stable Cv values ■ High durability ■ Suitable for high-purity gases *For more details, please refer to the PDF document or feel free to contact us.
- Company：KITZ SCT Corporation Tokyo Headoffice
- Price：Other
